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S-Litho 2024 crack download photolithographic process software with license

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Early litho pathfinding, process optimization and analysis
S-Litho represents advanced lithography simulation for semiconductor device manufacturing process development and optimization. It covers a wide range of applications in proximity printing, optical, immersion, extreme ultraviolet (EUV), and electron beam (e-beam) lithography. Process-limiting effects within the imaging system of an exposure tool can be thoroughly analyzed, taking the impact of mask and substrate topography on photoresist patterning into account. Interfacing S-Litho with Synopsys TCAD tools allows a seamless modeling of complex integration techniques such as double-patterning. The link between S-Litho and Synopsys Proteus mask synthesis applications accelerates the generation and validation of optical proximity correction (OPC) models and improves process robustness.

S-Litho 2024 with license

S-Litho provides a comprehensive set of features to predict the outcome of a photolithographic process. Physics-based models enable high simulation accuracy. As a computational lithography tool, S-Litho accelerates process development and reduces cost by eliminating experiments.

Key features include:

Wide range of lithographic techniques: Proximity printing, e-beam direct write, DUV projection lithography
Resist modeling in three dimensions (3D)
Resist model calibration environment
Powerful customization through scripting
Links to Synopsys’ Proteus and TCAD solutions